Magnetron sputtering of Ti3SiC2 thin films,from a compound target

被引：59

作者：

Eklund, P. ^{[1
]}

Beckers, M. ^{[1
]}

Frodelius, J. ^{[1
]}

Hogberg, H. ^{[1
]}

Hultman, L. ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys Chem & Biol, Thin Film Phys Div, IFM, S-58183 Linkoping, Sweden

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2007年 / 25卷 / 05期

关键词：

D O I：

10.1116/1.2757178

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ti3SiC2 thin films were synthesized by magnetron sputtering from Ti3SiC2 and Ti targets. Sputtering from a Ti3SiC2 target alone resulted in films with a C content of similar to 50 at. % or more, due to gas-phase scattering processes and differences in angular and energy distributions between species ejected from the target. Addition of Ti to the deposition flux from a Ti3SiC2 target is shown to bind the excess C in TiCx intergrown with Ti3SiC2 and Ti4SiC2. Additionally, a substoichiometric TiC, buffer layer is shown to serve as a C sink and enable the growth of Ti3SiC2. (c) 2007 American Vacuum Society.

引用

页码：1381 / 1388

页数：8

共 52 条

[11] Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films [J].

Eklund, P ;

Emmerlich, J ;

Högberg, H ;

Wilhelmsson, O ;

Isberg, P ;

Birch, J ;

Persson, ROÅ ;

Jansson, U ;

Hultman, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06) :2486-2495

[12]

EKLUND P, 2007, THESIS LINKOPING U

[13] Growth of Ti3SiC2 thin films by elemental target magnetron sputtering [J].

Emmerlich, J ;

Högberg, H ;

Sasvári, S ;

Persson, POÅ ;

Hultman, L ;

Palmquist, JP ;

Jansson, U ;

Molina-Aldareguia, JM ;

Czigány, Z .

JOURNAL OF APPLIED PHYSICS, 2004, 96 (09) :4817-4826

[14]

EMMERLICH J, IN PRESS WEAR

[15]

EMMERLICH J, IN PRESS J MAT RES

[16] Thermal stability of Ti3SiC2 thin films [J].

Emmerlich, Jens ;

Music, Denis ;

Eklund, Per ;

Wilhelmsson, Ola ;

Jansson, Ulf ;

Schneider, Jochen M. ;

Hogberg, Hans ;

Hultman, Lars .

ACTA MATERIALIA, 2007, 55 (04) :1479-1488

[17] Low-temperature transport properties of nanolaminates Ti3AlC2 and Ti4AlN3 -: art. no. 235108 [J].

Finkel, P ;

Barsoum, MW ;

Hettinger, JD ;

Lofland, SE ;

Yoo, HI .

PHYSICAL REVIEW B, 2003, 67 (23)

[18]

FRODELIUS J, UNPUB

[19] Self-propagating high-temperature synthesis of Ti3SiC2:: Study of the reaction mechanisms by time-resolved X-ray diffraction and infrared thermography [J].

Gauthier, Veronique ;

Cochepin, Benoit ;

Dubois, Sylvain ;

Vrel, Dominique .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2006, 89 (09) :2899-2907

[20]

HOFER WO, 1991, SPUTTERING PARTICLE, V3

← 1 2 3 4 5 6 →