Application of optical method for quantitative investigation of MgO erosion in a.c. plasma display panels

被引:9
作者
Choi, S [1 ]
Oh, SG [1 ]
Lee, S [1 ]
机构
[1] Ajou Univ, Dept Mol Sci & Technol, Paldal Ku, Suwon 442749, South Korea
关键词
etching; ion bombardment; a.c.-PDP; MgO;
D O I
10.1016/S0040-6090(00)01824-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The evidence for the non-uniform erosion of the MgO layer in a real a.c. plasma display panel was given by scanning electron microscopy and stylus surface profilometry. However, these techniques did not allow the quantitative study of the temporal and the spatial variation in MgO-layer thickness. Therefore, we constructed a microscopic spectrophotometer suitable for the transmission measurement from the area as small as 20 x 20 mum(2), which is necessary to probe MgO-layer thickness in a real micro-cell. The relative change in film thickness was determined either from the shift of the transmission extremum or from fitting the measured spectra using the parameterized optical functions. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:115 / 119
页数:5
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