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AGING CHARACTERISTICS OF AC PLASMA DISPLAY PANELS
被引:21
作者
:
ABOELFOTOH, MO
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ABOELFOTOH, MO
[
1
]
SAHNI, O
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
SAHNI, O
[
1
]
机构
:
[1]
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1981年
/ 28卷
/ 06期
关键词
:
D O I
:
10.1109/T-ED.1981.20407
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:645 / 653
页数:9
相关论文
共 17 条
[1]
INFLUENCE OF SECONDARY-ELECTRON EMISSION FROM MGO SURFACES ON VOLTAGE-BREAKDOWN CURVES IN PENNING MIXTURES FOR INSULATED-ELECTRODE DISCHARGES
ABOELFOTOH, MO
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
ABOELFOTOH, MO
LORENZEN, JA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
LORENZEN, JA
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(11)
: 4754
-
4759
[2]
IR AND HIGH-ENERGY ELECTRON-DIFFRACTION ANALYSES OF ELECTRON-BEAM-EVAPORATED MGO FILMS
ABOELFOTOH, MO
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
ABOELFOTOH, MO
PARK, KC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
PARK, KC
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
PLISKIN, WA
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
: 2910
-
2917
[3]
ABOELFOTOH MO, UNPUBLISHED
[4]
ABOELFOTOH MO, 1978, 1978 P BIEN DISPL RE, P62
[5]
EFFECT OF REACTIVE GAS DOPANTS ON MGO SURFACE IN AC PLASMA DISPLAY PANELS
AHEARN, WE
论文数:
0
引用数:
0
h-index:
0
AHEARN, WE
SAHNI, O
论文数:
0
引用数:
0
h-index:
0
SAHNI, O
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1978,
22
(06)
: 622
-
625
[6]
DISCHARGE TIME LAG IN A PLASMA DISPLAY - SELECTION OF PROTECTION LAYER (GAMMA-SURFACE)
ANDOH, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
ANDOH, S
MURASE, K
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
MURASE, K
UMEDA, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
UMEDA, S
NAKAYAMA, N
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
NAKAYAMA, N
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1976,
23
(03)
: 319
-
324
[7]
SURFACE AGING MECHANISMS OF AC PLASMA DISPLAY PANELS
BYRUM, BW
论文数:
0
引用数:
0
h-index:
0
机构:
OWENS ILLINOIS INC,LEVIS DEV PK,PERRYSBURG,OH 43557
OWENS ILLINOIS INC,LEVIS DEV PK,PERRYSBURG,OH 43557
BYRUM, BW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
22
(09)
: 685
-
691
[8]
CARTER G, 1968, ION BOMBARDMENT SOLI, pCH6
[9]
PLASMA PANELS
HABERLAN.PH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST DEV DIV,KINGSTON,NY 12401
IBM CORP,SYST DEV DIV,KINGSTON,NY 12401
HABERLAN.PH
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1973,
10
(05):
: 796
-
803
[10]
THEORY OF AUGER EJECTION OF ELECTRONS FROM METALS BY IONS
HAGSTRUM, HD
论文数:
0
引用数:
0
h-index:
0
HAGSTRUM, HD
[J].
PHYSICAL REVIEW,
1954,
96
(02):
: 336
-
365
←
1
2
→
共 17 条
[1]
INFLUENCE OF SECONDARY-ELECTRON EMISSION FROM MGO SURFACES ON VOLTAGE-BREAKDOWN CURVES IN PENNING MIXTURES FOR INSULATED-ELECTRODE DISCHARGES
ABOELFOTOH, MO
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
ABOELFOTOH, MO
LORENZEN, JA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
IBM CORP, DIV SYST COMMUN, KINGSTON, NY 12401 USA
LORENZEN, JA
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(11)
: 4754
-
4759
[2]
IR AND HIGH-ENERGY ELECTRON-DIFFRACTION ANALYSES OF ELECTRON-BEAM-EVAPORATED MGO FILMS
ABOELFOTOH, MO
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
ABOELFOTOH, MO
PARK, KC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
PARK, KC
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401
PLISKIN, WA
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
: 2910
-
2917
[3]
ABOELFOTOH MO, UNPUBLISHED
[4]
ABOELFOTOH MO, 1978, 1978 P BIEN DISPL RE, P62
[5]
EFFECT OF REACTIVE GAS DOPANTS ON MGO SURFACE IN AC PLASMA DISPLAY PANELS
AHEARN, WE
论文数:
0
引用数:
0
h-index:
0
AHEARN, WE
SAHNI, O
论文数:
0
引用数:
0
h-index:
0
SAHNI, O
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1978,
22
(06)
: 622
-
625
[6]
DISCHARGE TIME LAG IN A PLASMA DISPLAY - SELECTION OF PROTECTION LAYER (GAMMA-SURFACE)
ANDOH, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
ANDOH, S
MURASE, K
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
MURASE, K
UMEDA, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
UMEDA, S
NAKAYAMA, N
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
FUJITSU LABS LTD,ELECTRON DEVICES LAB,AKASHI 674,HYOGO,JAPAN
NAKAYAMA, N
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1976,
23
(03)
: 319
-
324
[7]
SURFACE AGING MECHANISMS OF AC PLASMA DISPLAY PANELS
BYRUM, BW
论文数:
0
引用数:
0
h-index:
0
机构:
OWENS ILLINOIS INC,LEVIS DEV PK,PERRYSBURG,OH 43557
OWENS ILLINOIS INC,LEVIS DEV PK,PERRYSBURG,OH 43557
BYRUM, BW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
22
(09)
: 685
-
691
[8]
CARTER G, 1968, ION BOMBARDMENT SOLI, pCH6
[9]
PLASMA PANELS
HABERLAN.PH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST DEV DIV,KINGSTON,NY 12401
IBM CORP,SYST DEV DIV,KINGSTON,NY 12401
HABERLAN.PH
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1973,
10
(05):
: 796
-
803
[10]
THEORY OF AUGER EJECTION OF ELECTRONS FROM METALS BY IONS
HAGSTRUM, HD
论文数:
0
引用数:
0
h-index:
0
HAGSTRUM, HD
[J].
PHYSICAL REVIEW,
1954,
96
(02):
: 336
-
365
←
1
2
→