XPS study of TiOx thin films deposited on glass substrates by the sol-gel process

被引:19
作者
Xu, WX
Zhu, S
Fu, XC
机构
[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[2] Nanjing Univ, Dept Chem, Nanjing 210093, Peoples R China
关键词
TiOx thin films; sol-gel process; quartz substrate;
D O I
10.1016/S0169-4332(98)00284-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin TiOx films deposited on quartz substrates have been studied using XPS and X-ray diffraction (XRD). It is found that different titanium oxide species coexist in the films. The dependencies of these species on the calcination temperature and film thickness are discussed. At the interface between the quartz substrate and the TiOx film, an oxygen deficiency is observed. Different diffusion mechanisms at the quartz/TiOx interface have been proposed to explain the behaviour of Si and Ti at low and high calcination temperatures. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:194 / 205
页数:12
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