Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

被引：30

作者：

Schulz-Ruhtenberg, M

Ihlemann, J

Heber, J

机构：

[1] Laser Lab Gottingen eV, D-37077 Gottingen, Germany

[2] Fraunhofer Inst Opt & Feinmech, D-07745 Jena, Germany

来源：

APPLIED SURFACE SCIENCE | 2005年 / 248卷 / 1-4期

关键词：

laser ablation; diffractive phase elements; SiOx; SiO2; UV-laser;

D O I：

10.1016/j.apsusc.2005.03.096

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Diffractive phase elements (DPE), consisting of a patterned UV-transparent layer on a UV-transparent substrate, were fabricated by three steps. A UV-absorbing SiOx-coating (x < 2) with a thickness matching to the required phase delay was deposited on a fused silica substrate. The coating was removed on a pixel array corresponding to a calculated two-dimensional quantized phase function (DPE-design). By a thermal annealing process the SiOx-coating was oxidised to UV-transparent SiO2, resulting in a UV-grade surface relief element. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：190 / 195

页数：6

共 16 条

[11]

SCHAFER D, 2000, P DIFFR OPT MICR DOM, P189

[12]

SCHAFER D, 2002, OSA, P149

[13] Fabrication of diffractive phase elements by F2-laser ablation of fused silica [J].

Schulz-Ruhtenberg, M ;

Ihlemann, H ;

Marowsky, G ;

Nejadmalayeri, AH ;

Ng, ML ;

Li, H ;

Herman, PR .

FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2003, 5063 :113-117

[14]

TURUNEN J, 1997, DIFFRACTIVE OPTICS I

[15] Rapid fabrication of diffractive optical elements by use of image-based excimer laser ablation [J].

Wang, XM ;

Leger, JR ;

Rediker, RH .

APPLIED OPTICS, 1997, 36 (20) :4660-4665

[16] DIFFRACTIVE OPTICAL-ELEMENTS - ITERATIVE CALCULATION OF QUANTIZED, BLAZED PHASE STRUCTURES [J].

WYROWSKI, F .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1990, 7 (06) :961-969

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