Self-assembled Ge dots: Growth, characterization, ordering, and applications

被引:67
作者
Schittenhelm, P
Engel, C
Findeis, F
Abstreiter, G
Darhuber, AA
Bauer, G
Kosogov, AO
Werner, P
机构
[1] Tech Univ Munchen, Walter Schottky Inst, D-85748 Garching, Germany
[2] Univ Linz, Inst Halbleitertech, A-4040 Linz, Austria
[3] Max Planck Inst Mikrostrukturforsch, D-06120 Halle, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 03期
关键词
D O I
10.1116/1.589942
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Stranski-Krastanow growth mode, which leads; to the self-assembled formation of dots, allows one to exceed the critical thickness without introducing dislocations. We report the coverage limits for the dislocation-free dot regime in dependence of the Ge content, and also the composition dependent thickness of the two-dimensional wetting layer. To reduce the size inhomogeneity of the self-assembled dots, we investigated ordering effects in Si/Ge-dot multilayers. The experiments do not only reveal a strong vertical ordering of the dots, but also a lateral correlation and a significantly increased size homogeneity is observed. Results on first device structures, a npn-infrared detector and a silicon based tunneling structure, both with embedded layers of self-assembled Ge dots, are presented. (C) 1998 American Vacuum Society.
引用
收藏
页码:1575 / 1581
页数:7
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