Large-area 3D nanostructures with octagonal quasicrystalline symmetry via phase-mask lithography

被引:42
作者
Bita, Ion
Choi, Taeyi
Walsh, Michael E.
Smith, Henry L.
Thomas, Edwin L.
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
关键词
D O I
10.1002/adma.200700178
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
3D nanostructured quasi crystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple-exposure interference lithography. Phase-mask lithography with corresponding PDMS masks produce bicontinuous 3D axial quasicrystal SU-8 structures (see figure).
引用
收藏
页码:1403 / +
页数:6
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