Large-area 3D nanostructures with octagonal quasicrystalline symmetry via phase-mask lithography

被引：42

作者：

Bita, Ion

Choi, Taeyi

Walsh, Michael E.

Smith, Henry L.

Thomas, Edwin L.

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 10期

关键词：

D O I：

10.1002/adma.200700178

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

3D nanostructured quasi crystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple-exposure interference lithography. Phase-mask lithography with corresponding PDMS masks produce bicontinuous 3D axial quasicrystal SU-8 structures (see figure).

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页码：1403 / +

页数：6

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