A low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

被引:63
作者
Sheng, LY
Tang, ZN
Wu, J
Chan, PCH [1 ]
Sin, JKO
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong
[2] Dalian Univ Technol, Dalian, Peoples R China
基金
中国国家自然科学基金;
关键词
integrated gas sensor; maskless tin oxide sputtering; lower power;
D O I
10.1016/S0925-4005(98)00092-6
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
This paper describes a CMOS compatible integrated gas sensor. The device was designed so that the front-end fabrication is fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin films using maskless r.f. SnO2 sputtering. The sensors exhibited high sensitivities to gases, such as ethanol and hydrogen. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:81 / 87
页数:7
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