The electrostatic contribution to the long-range interactions between tungsten and oxide surfaces under ultrahigh vacuum

被引：15

作者：

Sounilhac, S ^{[1
]}

Barthel, E ^{[1
]}

Creuzet, F ^{[1
]}

机构：

[1] CNRS, Lab St Gobain Surface Verre & Interfaces, F-93303 Aubervilliers, France

来源：

APPLIED SURFACE SCIENCE | 1999年 / 140卷 / 3-4期

关键词：

AC AFM; metal/oxide; van der Waals forces; electrostatic forces;

D O I：

10.1016/S0169-4332(98)00564-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The force gradient between a tungsten tip and a flat oxide substrate has been measured as a function of tip-to-surface distance, D, using an oscillating cantilever technique under Ultrahigh Vacuum. We analyze the relative contribution of van der Waals and electrostatic forces between a W tip and SiO2, TiO2 and MgO substrates. The observed Hamaker constants are in agreement with the Lifshitz theory, while we tentatively correlate the surface charge densities with the gap of the oxides. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：411 / 414

页数：4

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