Copper thin film of alternating textures

被引:20
作者
Huang, HC [1 ]
Wei, HL
Woo, CH
Zhang, XX
机构
[1] Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, Troy, NY 12180 USA
[2] Hong Kong Polytech Univ, Dept Mech Engn, Hong Kong, Hong Kong, Peoples R China
[3] Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430073, Peoples R China
[4] Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[5] Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Hong Kong, Hong Kong, Peoples R China
关键词
D O I
10.1063/1.1583866
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is common for thin films to have a predominant texture, but not alternating textures. In this letter, we report a copper film of alternating textures through self-organization. Using dc magnetron sputtering technique, we deposit copper films on a SiO2/Si(111) substrate. A thin layer of copper of [111] texture is first developed, and another thin layer of [110] ensued. As deposition continues, a third layer of copper of [111] texture is formed on the top, leading to a sandwich copper thin film of alternating [111] and [110] textures. The film morphology is characterized with scanning electron microscopy and atomic force microscopy and the texture with x-ray diffraction. Based on anisotropic elastic analyses and molecular dynamics simulations, we propose a model of texture evolution during the formation of multilayers, attributing the texture evolution to the competition of surface and strain energies. (C) 2003 American Institute of Physics.
引用
收藏
页码:4265 / 4267
页数:3
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