Ultrafast electron solvation dynamics in D2O/Cu(111):: influence of coverage and structure

被引：20

作者：

Gahl, C ^{[1
]}

Bovensiepen, U ^{[1
]}

Frischkorn, C ^{[1
]}

Morgenstern, K ^{[1
]}

Rieder, KH ^{[1
]}

Wolf, M ^{[1
]}

机构：

[1] Free Univ Berlin, Fachbereich Phys, D-14195 Berlin, Germany

来源：

SURFACE SCIENCE | 2003年 / 532卷

关键词：

surface electronic phenomena (work function; surface potential; surface states; etc.); water; copper; visible and ultraviolet photoelectron spectroscopy; scanning tunneling spectroscopies; work function measurements; energy dissipation;

D O I：

10.1016/S0039-6028(03)00186-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Using femtosecond time-resolved two-photon photoelectron spectroscopy we have studied the dynamics of photoexcited electrons injected from a Cu(111) substrate into the conduction band of ultrathin ice layers. Ultrafast localization of the injected electrons within <50 fs is followed by a stabilization on a time scale of 0.1-1 ps due to local rearrangements of water dipoles. The dynamics of this electron solvation process are very similar for amorphous and crystalline ice, but exhibit a pronounced coverage dependence with two different regimes, which are attributed to solvation sites in the interior and at the surface of the adlayer. Additional information on the adsorbate structure is obtained from low-temperature scanning tunneling microscopy. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：108 / 112

页数：5

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