Fabrication of diffraction gratings for hard X-ray phase contrast imaging

被引：207

作者：

David, C. ^{[1
]}

Bruder, J. ^{[1
]}

Rohbeck, T. ^{[1
]}

Gruenzweig, C. ^{[1
]}

Kottler, C. ^{[1
]}

Diaz, A. ^{[1
]}

Bunk, O. ^{[1
]}

Pfeiffer, F. ^{[1
]}

机构：

[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 2007年 / 84卷 / 5-8期

关键词：

radiography; medical imaging; anisotropic silicon wet etching; gold electroplating;

D O I：

10.1016/j.mee.2007.01.151

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a method for X-ray phase contrast imaging, which is based on a grating interferometer. The technique is capable of recording the phase shift of hard X-rays travelling through a sample, which greatly enhances the contrast of low absorbing specimen compared to conventional amplitude contrast images. Unlike other existing X-ray phase contrast imaging methods, the grating interferometer also works with incoherent radiation from a standard X-ray tube. The key components are three gratings with silicon and gold structures, which have dimensions in the micrometer range and high aspect ratios. The fabrication processes, which involve photolithography, anisotropic wet etching, and electroplating, are described in this article for each of the three gratings. An example of an X-ray phase contrast image acquired with the grating interferometer is given. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：1172 / 1177

页数：6

共 7 条

[1] Differential x-ray phase contrast imaging using a shearing interferometer [J].