Correlation between plasma expansion and damage threshold by femtosecond laser ablation of fused silica

被引:19
作者
Axente, E. [1 ,2 ]
Noel, S. [2 ]
Hermann, J. [2 ]
Sentis, M. [2 ]
Mihailescu, I. N. [1 ]
机构
[1] Natl Inst Lasers Plasma & Radiat Phys, Lasers Dept, RO-77125 Bucharest, Romania
[2] Univ Aix Marseille 2, CNRS, Lab LP3, F-13288 Marseille, France
关键词
D O I
10.1088/0022-3727/41/10/105216
中图分类号
O59 [应用物理学];
学科分类号
摘要
We experimentally investigated the ultrafast ablation of fused silica under 100 fs laser pulses at 800 nm in vacuum. The ablation plume dynamics was monitored by plasma fast imaging and time- and space-resolved optical emission spectroscopy (OES). We used optical microscopy to determine the ablation threshold and rate in multi-shot operation at 100 Hz. We found that, unlike metal ablation, the plasma generated by femtosecond laser pulses from a fused silica target had only one 'main' component. This evidence was supported by the results of OES. The characteristic expansion velocity of this unique component was about one order of magnitude higher than the velocity of the fast plume component observed during metal ablation. We identified in optical emission spectra Si and O neutral atoms only, characterized by very different expansion velocities. In contrast to metal ablation, the 'slow' plasma component usually assigned in the literature to optical emission from nanoparticles was not detected by either plasma fast imaging or OES even for the highest laser fluence used in our experiments. The influence of laser fluence on both plasma expansion and ablation rate was investigated. We considered that the ablation mechanism in this case was dominated by thermal material removal processes.
引用
收藏
页数:6
相关论文
共 47 条
[1]   Time-resolved spectroscopy measurements of a titanium plasma induced by nanosecond and femtosecond lasers [J].
Albert, O ;
Roger, S ;
Glinec, Y ;
Loulergue, JC ;
Etchepare, J ;
Boulmer-Leborgne, C ;
Perrière, J ;
Millon, E .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2003, 76 (03) :319-323
[2]   Femtosecond laser pulse irradiation of solid targets as a general route to nanoparticle formation in a vacuum [J].
Amoruso, S ;
Ausanio, G ;
Bruzzese, R ;
Vitiello, M ;
Wang, X .
PHYSICAL REVIEW B, 2005, 71 (03)
[3]   Experimental and theoretical investigations of femtosecond laser ablation of aluminum in vacuum [J].
Amoruso, S ;
Bruzzese, R ;
Vitiello, M ;
Nedialkov, NN ;
Atanasov, PA .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (04)
[4]   Study of the plasma plume generated during near IR femtosecond laser irradiation of silicon targets [J].
Amoruso, S ;
Altucci, C ;
Bruzzese, R ;
de Lisio, C ;
Spinelli, N ;
Velotta, R ;
Vitiello, M ;
Wang, X .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 79 (4-6) :1377-1380
[5]   Laser processing of sapphire with picosecond and sub-picosecond pulses [J].
Ashkenasi, D ;
Rosenfeld, A ;
Varel, H ;
Wahmer, M ;
Campbell, EEB .
APPLIED SURFACE SCIENCE, 1997, 120 (1-2) :65-80
[6]   Optically produced arrays of planar nanostructures inside fused silica [J].
Bhardwaj, VR ;
Simova, E ;
Rajeev, PP ;
Hnatovsky, C ;
Taylor, RS ;
Rayner, DM ;
Corkum, PB .
PHYSICAL REVIEW LETTERS, 2006, 96 (05)
[7]   Gas-dynamic effects of the interaction between a pulsed laser-ablation plume and the ambient gas: analogy with an underexpanded jet [J].
Bulgakov, AV ;
Bulgakova, NM .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (06) :693-703
[8]   Nanoscale modification of silicon surfaces via Coulomb explosion [J].
Cheng, HP ;
Gillaspy, JD .
PHYSICAL REVIEW B, 1997, 55 (04) :2628-2636
[9]   Ultra-fast laser absorption and ablation dynamics in wide-band-gap dielectrics [J].
Chowdhury, IH ;
Wu, AQ ;
Xu, X ;
Weiner, AM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 81 (08) :1627-1632
[10]   Writing waveguides in glass with a femtosecond laser [J].
Davis, KM ;
Miura, K ;
Sugimoto, N ;
Hirao, K .
OPTICS LETTERS, 1996, 21 (21) :1729-1731