Titanium implantation in bulk and thin film amorphous silica

被引：20

作者：

Tisserand, S ^{[1
]}

Flory, F

Gatto, A

Roux, L

Adamik, M

Kovacs, I

机构：

[1] Domaine Univ St Jerome, Ecole Natl Super Phys Marseille, Lab Opt Surfaces & Couches Minces, F-13397 Marseille 20, France

[2] ZA Les Pradeaux, Ion Beam Serv, F-13850 Greasque, France

[3] Hungarian Acad Sci, Tech Phys Res Inst, H-1325 Budapest, Hungary

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 83卷 / 10期

关键词：

D O I：

10.1063/1.367332

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Both bulk and thin film amorphous silica implanted with titanium were investigated. We studied the induced modifications of the microstructure and the consequences on the optical properties. We determined the refractive index profile of implanted materials from guided wave measurements and we show that it matches the distribution of titanium. An increase in refractive index of up to 0.9 can be obtained by high dose implantation. A study of thermal annealing in air shows that the implanted materials exhibit low optical losses. (C) 1998 American Institute of Physics.

引用

页码：5150 / 5153

页数：4

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