Infrared measurements of InN films at low temperatures

被引:14
作者
Ishitani, Y [1 ]
Xu, K [1 ]
Terashima, W [1 ]
Hashimoto, N [1 ]
Yoshitani, M [1 ]
Hata, T [1 ]
Yoshikawa, A [1 ]
机构
[1] Chiba Univ, Dept Elect & Mech Engn, Chiba, Japan
来源
5TH INTERNATIONAL CONFERENCE ON NITRIDE SEMICONDUCTORS (ICNS-5), PROCEEDINGS | 2003年 / 0卷 / 07期
关键词
D O I
10.1002/pssc.200303400
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
InN crystals with the electron concentration N-e of 4-11 x 10(18) cm(-3) are grown on sapphire substrates by molecular beam epitaxy. Optical reflectance and transmission measurements are performed in a temperature range of 5 to 296 K. The reflectance spectra are analysed by simulation including the longitudinal optical phonon-plasmon coupling scheme. At a N-e value of 4 x 10(18) cm(-3), the electronic states are found to be still degenerated. An anomalous temperature dependence of the bandgp energy E-s is found; with decreasing temperature E-g increases, and then decreases below 50 K. This decrease is smaller for samples with smaller N-e. In spite of this energy shift the decrease of N-e is too small to be detected. The effective electron mass of the intrinsic region is estimated to be 0.1m(0). (C) 2003 WILEYNCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:2838 / 2841
页数:4
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