Reliability of contacts for press-pack high-power devices

被引:5
作者
Vobecky, J [1 ]
Kolesnikov, D [1 ]
机构
[1] Czech Tech Univ, Dept Microelect, Prague 16627 6, Czech Republic
关键词
D O I
10.1016/j.microrel.2005.07.076
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Reliability of high-power silicon diodes with different anode contact material (Al, PtSiCu, PtSiCuAu) was tested in the conditions of free-floating silicon in pressed package. Pressure, thermal and cycling tests were applied without foils to buffer excessive loading. Thin PtSi layer was found too brittle for usage in so hard conditions. Copper stacks with thin PtSi interlayer provide low voltage drop and show potential to survive such hard stress conditions under thermnal and power load cycle. 5 mu m thick PtSiCu contacts showed the best thermo-mechanical properties. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1676 / 1681
页数:6
相关论文
共 5 条
[1]  
*ABB SEM AG, 1996, PHAS CONTR THYRIST
[2]   Performance of vertical power devices with contact-level copper metallization [J].
Cook, J ;
Azam, M ;
Leung, P ;
Grupen, M .
THIN SOLID FILMS, 1999, 348 (1-2) :14-21
[3]   Mechanical reliability of CVD-copper thin films [J].
Jongste, JF ;
Lokker, JP ;
Janssen, GCAM ;
Radelaar, S ;
Torres, J ;
Palleau, J .
MICROELECTRONIC ENGINEERING, 1997, 33 (1-4) :39-46
[4]   Advanced local lifetime control for higher reliability of power devices [J].
Vobecky, J ;
Hazdra, P .
MICROELECTRONICS RELIABILITY, 2003, 43 (9-11) :1883-1888
[5]  
WETZIG K, 2003, METAL BASED THIN FIL