Liquid phase deposition of a film of silica with an organic functional group

The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate :in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/l) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process. (C) 1998 Elsevier Science B.V. All rights reserved.