A NEW PROCESS FOR SILICA COATING

被引：291

作者：

NAGAYAMA, H

HONDA, H

KAWAHARA, H

机构：

来源：

关键词：

D O I：

10.1149/1.2096198

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2013 / 2016

页数：4

共 8 条

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[7] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS
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[8] OPTICAL AND DIELECTRIC-PROPERTIES OF THIN SIOX FILMS OF VARIABLE COMPOSITION
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