COMPARISON OF PROPERTIES OF DIELECTRIC FILMS DEPOSITED BY VARIOUS METHODS

被引：491

作者：

PLISKIN, WA ^{[1
]}

机构：

[1] IBM CORP, DIV SYST PROD, E FISHKILL FACIL, HOPEWELL JUNCTION, NY 12533 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 05期

关键词：

D O I：

10.1116/1.569413

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1064 / 1081

页数：18

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