Low-n mesoporous silica films:: structure and properties

被引：21

作者：

Konjhodzic, D

Bretinger, H

Wilczok, U

Dreier, A

Ladenburger, A

Schmidt, M

Eich, M

Marlow, F

机构：

[1] Max Planck Inst Kohlenforsch, D-45470 Mulheim, Germany

[2] Univ Ulm, Abt Halbleiterphys, D-89069 Ulm, Germany

[3] TU Hamburg Harburg, D-21073 Hamburg, Germany

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2005年 / 81卷 / 02期

关键词：

D O I：

10.1007/s00339-005-3244-y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The properties and structure of mesoporous silica films are investigated. Because of their extremely low refractive index (n=1.14), these films are interesting optical waveguide supports. The films have been synthesized by a template-modified sol-gel process using the triblock copolymer Pluronic P123. A significant dependence of the formed structure on the processing conditions has been revealed, allowing an appreciable structure tuning. One set of processing conditions allows the reproducible synthesis of low-n films. They are optically clear, mechanically and chemically resistant, extremely smooth, and sufficiently thick (1 mu m). Under other processing conditions a novel mesoporous layer structure was synthesized that has very large and well-defined nanoscopic voids.

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页码：425 / 432

页数：8

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