Resistive memory switching of CuxO films for a nonvolatile memory application

被引:52
作者
Lv, H. B. [1 ]
Yin, M. [1 ]
Fu, X. F. [1 ]
Song, Y. L. [1 ]
Tang, L. [1 ]
Zhou, P. [1 ]
Zhao, C. H. [1 ]
Tang, T. A. [1 ]
Chen, B. A. [1 ]
Lin, Y. Y. [1 ]
机构
[1] Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China
基金
中国国家自然科学基金;
关键词
CuxO; on/off ratio; plasma oxidation; resistive switching; retention test;
D O I
10.1109/LED.2008.917109
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Polyerystalline CuxO films produced by plasma oxidation are investigated for nonvolatile memory applications. Reversible bistable resistive switching from a high-resistance state to a low-resistance state, and vice versa, is observed in an integrated Al/CuxO/Cu structure under voltage sweeping. More than 3000 repetitive cycles are observed in 180-mu m memory devices with an on/off ratio of ten times. Data testing shows that the devices meet the ten-year retention requirement for the storage of programmed logic signals.
引用
收藏
页码:309 / 311
页数:3
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