共 11 条
Resistive memory switching of CuxO films for a nonvolatile memory application
被引:52
作者:

Lv, H. B.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Yin, M.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Fu, X. F.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Song, Y. L.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Tang, L.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Zhou, P.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Zhao, C. H.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Tang, T. A.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Chen, B. A.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China

Lin, Y. Y.
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Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China
机构:
[1] Fudan Univ, ASIC & Syst State Key Lab, Dept Microelect, Shanghai 200433, Peoples R China
基金:
中国国家自然科学基金;
关键词:
CuxO;
on/off ratio;
plasma oxidation;
resistive switching;
retention test;
D O I:
10.1109/LED.2008.917109
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Polyerystalline CuxO films produced by plasma oxidation are investigated for nonvolatile memory applications. Reversible bistable resistive switching from a high-resistance state to a low-resistance state, and vice versa, is observed in an integrated Al/CuxO/Cu structure under voltage sweeping. More than 3000 repetitive cycles are observed in 180-mu m memory devices with an on/off ratio of ten times. Data testing shows that the devices meet the ten-year retention requirement for the storage of programmed logic signals.
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页码:309 / 311
页数:3
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