Functionalization of hydrogen-free diamond-like carbon films using open-air dielectric barrier discharge atmospheric plasma treatments

被引:18
作者
Endrino, J. L. [1 ,2 ]
Marco, J. F. [3 ]
Allen, M. [4 ]
Poolcharuansin, P. [1 ,5 ]
Phani, A. R. [6 ]
Albella, J. M. [2 ]
Anders, A. [1 ]
机构
[1] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
[2] CSIC, Inst Mat Madrid, E-28049 Madrid, Spain
[3] CSIC, Inst Quim Fis Rocasolano, E-28006 Madrid, Spain
[4] SUNY Upstate Med Univ, Syracuse, NY 13210 USA
[5] Mahasarakham Univ, Maha Sarakham 44150, Thailand
[6] CNR INFM, Reg Lab, CASTI, I-67100 Laquila, Italy
关键词
ion implantation and deposition; DLC; XPS; wettability; cell viability;
D O I
10.1016/j.apsusc.2008.02.065
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A dielectric barrier discharge (DBD) technique has been employed to produce uniform atmospheric plasmas of He and N-2 gas mixtures in open air in order to functionalize the surface of filtered-arc deposited hydrogen-free diamond-like carbon (DLC) films. XPS measurements were carried out on both untreated and He/N-2 DBD plasma-treated DLC surfaces. Chemical states of the C 1s and N 1s peaks were collected and used to characterize the surface bonds. Contact angle measurements were also used to record the short- and long-term variations in wettability of treated and untreated DLC. In addition, cell viability tests were performed to determine the influence of various He/N-2 atmospheric plasma treatments on the attachment of osteoblast MC3T3 cells. Current evidence shows the feasibility of atmospheric plasmas in producing long-lasting variations in the surface bonding and surface energy of hydrogen-free DLC and consequently the potential for this technique in the functionalization of DLC-coated devices. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:5323 / 5328
页数:6
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