Influence of the forming electrolyte on the electrical properties of tantalum and niobium oxide films: an EIS comparative study

被引：65

作者：

Cavigliasso, GE ^{[1
]}

Esplandiu, MJ ^{[1
]}

Macagno, VA ^{[1
]}

机构：

[1] Univ Nacl Cordoba, Fac Ciencias Quim, Dept Fisicoquim, INFIQC, RA-5000 Cordoba, Argentina

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1998年 / 28卷 / 11期

关键词：

anodic oxide films; tantalum; niobium; impedance spectroscopy; dielectric behaviour;

D O I：

10.1023/A:1003449917148

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electrochemical oxidation of Ta and Nb and the dielectric behaviour of the oxide films thus formed were investigated in the following electrolytes: H2SO4, HNO3, H3PO4 and NaOH. Characterization of the films was carried out by means of potentiodynamic current-potential profiles tin the range 0-8 V) and electrochemical impedance spectra tin the range 0.1 Hz-100 kHz). The a.c. response of the oxide films was modelled as a single layer structure on the basis of an equivalent circuit with constant phase elements (CPE). The dependence of the oxide resistance and oxide capacitance with potential is also reported.

引用

页码：1213 / 1219

页数：7

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