ELECTROCHEMICAL IMPEDANCE SPECTROSCOPIC INVESTIGATION OF TANTALUM AND ITS PASSIVE FILMS IN ACIDIC AND NEUTRAL SOLUTIONS

被引：42

作者：

BADAWY, WA ^{[1
]}

ISMAIL, KM ^{[1
]}

机构：

[1] CAIRO UNIV,FAC SCI,DEPT CHEM,GIZA,EGYPT

来源：

ELECTROCHIMICA ACTA | 1993年 / 38卷 / 15期

关键词：

TA-PASSIVE FILM; IMPEDANCE; ANODIZATION; OXIDE FILM; GALVANOSTATIC;

D O I：

10.1016/0013-4686(93)80103-7

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Tantalum is a typical valve metal, and many investigations have been concerned with the growth of thin oxide films on its surface. Electrochemical impedance spectroscopy (EIS) was used to study the open circuit growth of thin oxide films on Ta in different acidic and neutral solutions. The effects of formation voltage, formation current density and passivation medium on the properties and stabilities of the anodic oxide films formed on Ta was also investigated. The results revealed that these films are stable in different aggressive media. The stability of the passive film was found to depend upon the passivation medium rather than the ambient electrolyte.

引用

页码：2231 / 2237

页数：7

共 26 条

[1] ANODIZATION AND BREAKDOWN MODEL OF TA2O5 FILMS
ALBELLA, JM
MONTERO, I
MARTINEZDUART, JM
[J]. THIN SOLID FILMS, 1985, 125 (1-2) : 57 - 62
[2] ALLAH AGG, 1989, J APPL ELECTROCHEM, V19, P768
[3] AMMAR IA, 1972, WERKST KORROS, V23, P168
[4] AMMAR IA, 1981, Z WERKSTOFFTECH, V12, P421
[5] BADAWY WA, IN PRESS BR CORROS
[6] BADAWY WA, UNPUB CORROS SCI
[7] AC-IMPEDANCE MEASUREMENTS ON ALUMINUM BARRIER TYPE OXIDE-FILMS
BESSONE, J
MAYER, C
JUTTNER, K
LORENZ, WJ
[J]. ELECTROCHIMICA ACTA, 1983, 28 (02) : 171 - 175
[8] BREITER MW, 1970, ELECTROCHIM ACTA, V15, P1145
[9] DELFOCA CJ, 1970, J ELECRROCHEM SOC, V117, P1548
[10] GROWTH MECHANISM OF THIN ANODIC OXIDE FILMS ON TANTALUM .I. SELF-ANODIZATION USING AN EXTERNAL LOAD RESISTOR
DREINER, R
LEHOVEC, K
SCHIMMEL, J
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) : 395 - +

← 1 2 3 →