Computed electron oscillation inside the duct of a vacuum arc source

被引:9
作者
Kwok, TK
Zhang, T
Chu, PK [1 ]
Bilek, MMM
Brown, IG
机构
[1] City Univ Hong Kong, Dept Phys & Mat Sci, 83 Tat Chee Ave, Kowloon, Peoples R China
[2] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
D O I
10.1063/1.370103
中图分类号
O59 [应用物理学];
学科分类号
摘要
A three-dimensional numerical model has been developed to simulate the motion of electrons inside the duct of a vacuum arc metal source. It is found that electrons will travel back and forth along the center axis inside the duct tube. This phenomenon of electron oscillation can be explained by the combined effects of the electric and magnetic fields. The electron oscillation will increase the charge state of the positive ions and the ions will gain more energy. Due to the influence of electron oscillation, the plasma throughput of the duct will be different from that of a duct under the influence of only the magnetic field. This finding should be taken into account when designing metal arc sources and optimizing their performance. (C) 1999 American Institute of Physics. [S0021-8979(99)05209-3].
引用
收藏
页码:6381 / 6384
页数:4
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