Self-aligned vertical electrostatic combdrives for micromirror actuation

In this paper, we analyze the effect of misalignment in electrostatic combdrives, and describe a fabrication technology that minimizes misalignment in vertical electrostatic combdrives by creating self-aligned, vertically staggered electrodes. Self-alignment of the interdigitated electrodes simplifies fabrication and minimizes failures due to electrostatic instability, thus enabling fabrication of narrow-gap, high-force actuators with high yield. The process is based on deep-reactive ion etching (DRIE) of buried-patterned silicon-on-insulator (SOI) wafers. Measurements on fabricated combdrives show relative misalignment of less than 0.05 mum. This corresponds to less than 0.1% misalignment, which, according to our analysis, results in a travel range of 98% of that for perfectly aligned drives. The validity of the process is demonstrated by fabrication of scanning micromirrors measuring 300 mum by 100 mum. Optical angular deflections from 4degrees at low frequency to 40degrees at resonance were measured for an applied voltage of 75 Vpp. Resonant frequencies ranged from 5 kHz to 15 kHz for these devices, making them suitable for high-speed, high-resolution optical scanning and switching.