Microwave performance of 0.25 mu m doped channel GaN/AlGaN heterostructure field effect transistor at elevated temperatures

被引:39
作者
Chen, Q
Gaska, R
Khan, MA
Shur, MS
Ping, A
Adesida, I
Burm, J
Schaff, WJ
Eastman, LF
机构
[1] RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
[2] UNIV ILLINOIS,MICROELECT LAB,URBANA,IL 61801
[3] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853
关键词
field effect transistors; microwave transistors;
D O I
10.1049/el:19970403
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors report the DC and microwave performance of a 0.25 mu m gate doped channel Al0.14Ga0.86N/GaN HFETs exhibiting a cutoff frequency of 37.5GHz and a maximum frequency of oscillations of 80.4GHz. The calculations of the Fermi level position and comparison with the expected conduction band discontinuity confirm that the channel in these transistors is doped. DC and microwave characteristics of these devices do not change much with temperature up to at least 200 and 90 degrees C, respectively.
引用
收藏
页码:637 / 639
页数:3
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