Metallic resistively coupled single-electron transistor

被引:12
作者
Pashkin, YA
Nakamura, Y
Tsai, JS
机构
[1] NEC Corp Ltd, Fundamental Res Labs, Ibaraki, Osaka 3058501, Japan
[2] Japan Sci & Technol Corp, Kawaguchi, Saitama 3320012, Japan
关键词
D O I
10.1063/1.122973
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have fabricated and measured transport properties of resistively coupled single-electron transistors (R-SETs). In our version, a chromium thin-film resistive strip served as a gate and was connected directly to a mesoscopic island formed between two ultrasmall Al/AlO(x)/Al tunnel junctions. In current-voltage-gate voltage dependences of the R-SETs, a characteristic Coulomb blockade pattern was observed. Our simulations based on the orthodox theory of single-electron tunneling are in good qualitative agreement with the experimental data and indicate excessive electron temperature of the devices. (C) 1999 American Institute of Physics. [S0003-6951(99)00701-9].
引用
收藏
页码:132 / 134
页数:3
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