Ceramic surface modification by a keV ion irradiation

被引：5

作者：

Choi, WK ^{[1
]}

Choi, SC ^{[1
]}

Jung, HJ ^{[1
]}

Koh, SK ^{[1
]}

机构：

[1] Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1999年 / 148卷 / 1-4期

关键词：

keV ion beam; metal film adhesion; functional layer; ceramic surface modification;

D O I：

10.1016/S0168-583X(98)00848-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

New functional complexes such as AlON and SiON were successfully formed by keV Ar+ ion irradiation with concurrent reactive pas blowing near the irradiated AlN and Si3N4 ceramic surfaces. Single crystal Al2O3 was also treated by only Nt bombardment. At energies higher than 500 eV, AlON bonding arose, while AlN bonds were formed at 1 keV irradiation. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：740 / 744

页数：5