Lithium depth profiling in thin electrochromic WO3 films

被引:16
作者
Krings, LHM
Tamminga, Y
van Berkum, J
Labohm, F
van Veen, A
Arnoldbik, WM
机构
[1] Philips CFT, NL-5656 AA Eindhoven, Netherlands
[2] Philips Res, NL-5656 AA Eindhoven, Netherlands
[3] Delft Univ Technol, Interfac Reactor Inst, NL-2629 JB Delft, Netherlands
[4] Univ Utrecht, Debye Inst, Afdeling Nat Kunde Aboom Grenslaagfys, NL-8508 TA Utrecht, Netherlands
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1999年 / 17卷 / 01期
关键词
D O I
10.1116/1.581573
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Li profiles in sol-gel prepared electrochromic WO3 thin films have been characterized using three different techniques: neutron depth profiling (NDP), secondary ion mass spectrometry (SIMS), and elastic recoil detection (ERD). The results have been evaluated with respect to their concentration sensitivity and depth resolution. NDP and SIMS led to comparable results in terms of the shape of the profiles. The NDP results were quantified by using a calibration sample. NDP has the advantage that it is a quantitative nondestructive technique while SIMS has a very high sensitivity and depth resolution. Another advantage of NDP is that there is very little risk of neutron-induced Li migration during the measurement because of the very low energy of the incoming thermal neutrons. ERD was found to have a limited depth resolution, attributable to deterioration of the sample as a result of ion bombardment. However, the absolute amount of Li can be very accurately quantified with this technique. (C) 1999 American Vacuum Society. [S0734-2101(99)00601-6].
引用
收藏
页码:198 / 205
页数:8
相关论文
共 16 条
[1]  
Bange K., 1990, Advanced Materials, V2, P10, DOI 10.1002/adma.19900020103
[2]  
BAUCKE FGK, 1985, CHEM BRIT, V21, P643
[3]   USE OF NEUTRON-INDUCED REACTIONS FOR LIGHT-ELEMENT PROFILING AND LATTICE LOCALIZATION [J].
BIERSACK, JP ;
FINK, D ;
HENKELMANN, R ;
MULLER, K .
NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :93-97
[4]   OPTICAL AND PHOTOELECTRIC PROPERTIES AND COLOR CENTERS IN THIN-FILMS OF TUNGSTEN OXIDE [J].
DEB, SK .
PHILOSOPHICAL MAGAZINE, 1973, 27 (04) :801-822
[5]   ANALYTICAL APPLICATIONS OF NEUTRON DEPTH PROFILING [J].
DOWNING, RG ;
MAKI, JT ;
FLEMING, RF .
JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES, 1987, 112 (01) :33-46
[6]   NEUTRON DEPTH PROFILING AT THE NATIONAL BUREAU OF STANDARDS [J].
DOWNING, RG ;
FLEMING, RF ;
LANGLAND, JK ;
VINCENT, DH .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :47-51
[7]  
Feldman L. C., 1986, Fundamentals of Surface and Thin Film Analysis
[8]  
Granqvist C. G., 1995, HDB INORGANIC ELECTR
[9]   ELECTROCHEMICAL DEGRADATION OF WO3.NH2O THIN-FILMS [J].
JUDEINSTEIN, P ;
MORINEAU, R ;
LIVAGE, J .
SOLID STATE IONICS, 1992, 51 (3-4) :239-247
[10]  
LAMAZE GP, 1997, UNPUB P ECASIA 97 GO