Modification in optical properties of negative Cu ion implanted ZnO

被引：14

作者：

Kono, K

Arora, SK

Kishimoto, N

机构：

[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan

[2] Univ Dublin Trinity Coll, Dept Phys, Dublin 2, Ireland

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 206卷

关键词：

ion implantation; Cu nanoparticle; optical property;

D O I：

10.1016/S0168-583X(03)00747-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Nanoparticles of Cu were formed in the zinc oxide (ZnO) substrate by negative ion implantation. Zinc oxide was chosen, because of its possibility for photonic applications, as a semiconductor with high radiation resistance. Negative Cu ions of 60 keV were implanted to (0001) oxygen-face single crystal. The total dose varied in a range of 1 x 10(15)-1 x 10(17) ions/cm(2). After implantation and after post-irradiation annealing, optical absorption was measured in a UV-IR range and the radiation damage was evaluated by XRD and RBS. The formation of Cu nanoparticle was verified by a surface plasmon resonance peak in absorption spectra. The crystallinity of ZnO was kept well below the tolerance dose of 1 x 10(16) ions/cm(2), which is large in comparison with other semiconductors. It is concluded that ZnO is a promising candidate for nanoparticle-dispersed optical materials, together with functionality of semiconductor. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：291 / 294

页数：4