First principles study of oxygen vacancy defects in tantalum pentoxide

被引:96
作者
Ramprasad, R [1 ]
机构
[1] Motorola Inc, Semicond Prod Sector, Tempe, AZ 85284 USA
关键词
D O I
10.1063/1.1615700
中图分类号
O59 [应用物理学];
学科分类号
摘要
First principles total energy calculations were performed to characterize oxygen vacancy defects in tantalum pentoxide (Ta2O5). A simplified version of the crystalline orthorhombic phase of Ta2O5 was used in this study. Results indicate that O vacancies in Ta2O5 can be broadly classified based on their location in the lattice. One type of vacancy that occupies the "in-plane" sites displays deep or midgap occupied states and shallow unoccupied states, while a second type occupying "cap" sites results in shallow occupied states. For a wide range of Fermi levels or chemical potentials, the neutral and +2 charged states of the in-plane type vacancy and the +2 charge state of the cap type vacancy are found to be most stable. (C) 2003 American Institute of Physics.
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页码:5609 / 5612
页数:4
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