New soft magnetic CoNiFe plated films with high Bs = 2.0-2.1 T

被引:89
作者
Osaka, T
Takai, M
Hayashi, K
Sogawa, Y
Ohashi, K
Yasue, Y
Saito, M
Yamada, K
机构
[1] Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab, Tokyo 169, Japan
[2] NEC Ibaraki Ltd, Ibaraki, Osaka 30801, Japan
[3] NEC Corp Ltd, Fuchu, Tokyo 183, Japan
基金
日本学术振兴会;
关键词
high B-s soft magnetic film; electroplating;
D O I
10.1109/20.706572
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A CoNiFe film with saturation magnetic flux density (B-s) greater than 2.0 tesla (T) has been prepared for the first time as a soft magnetic film; the coercivity (H-c) of the film is less than 160 A/m (2.0 Oe). This success was achieved by formulating a new plating bath and operating conditions to form fine grains. The film has a low H-c of less than 160 A/m, a low saturation magnetostriction (lambda(s)) of approximately 10(-6), and a high B-s of 2.0-2.1 T. The present invention is expected to contribute to accelerating the development of not only the technology of high-density magnetic recording but also the field of magnetic materials in general.
引用
收藏
页码:1432 / 1434
页数:3
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