Temperature-dependent small-signal and noise parameter measurements and modeling on InPHEMTs

被引:26
作者
Murti, MR [1 ]
Laskar, J
Nuttinck, S
Yoo, S
Raghavan, A
Bergman, JI
Bautista, J
Lai, R
Grundbacher, R
Barsky, M
Chin, P
Liu, PH
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
[3] TRW Co Inc, Redondo Beach, CA 90278 USA
关键词
cryogenic; high electron mobility transistor (HEMT); impact ionization; low-noise amplifier (LNA); noise; small-signal model;
D O I
10.1109/22.899016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we present detailed on-wafer S-parameter and noise parameter measurements and modeling of InP/InAlAs/InGaAs high electron mobility transistors (0.1-mum gate length) at cryogenic temperatures, Various physical effects influencing small-signal parameters, especially the radio-frequency (RF) transconductance and RF output resistance and their temperature dependence, are discussed in detail. Accurate on-wafer noise parameter measurements are carried out from 300 to 18 K, and the variation of the equivalent noise temperatures of drain and source (T-d and T-g) are modeled against temperature. Based on these models, a cryogenic low-noise amplifier in the Ka-band is developed with a record-low noise temperature of 10 K.
引用
收藏
页码:2579 / 2587
页数:9
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