Ferroelectric properties of alkoxy-derived CaBi4Ti4O15 thin films on Pt-passivated Si

被引:78
作者
Kato, K
Suzuki, K
Nishizawa, K
Miki, T
机构
[1] Natl Ind Res Inst Nagoya, Kita Ku, Nagoya, Aichi 4628510, Japan
[2] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
10.1063/1.1349871
中图分类号
O59 [应用物理学];
学科分类号
摘要
CaBi4Ti4O15 (CBTi144) thin films were prepared by spin coating a precursor solution of metal alkoxides. As-deposited thin films began crystallization below 550 degreesC and reached full crystallinity of a single phase of layered perovskite at 650 degreesC via rapid thermal annealing in oxygen. The 650 degreesC annealed CBTi144 thin film showed random orientation on Pt-passivated Si substrate and exhibited P-E hysteresis loops. The remanent polarization (P-r) and coercive electric field (E-c) were 9.4 muC/cm(2) and 106 kV/cm, respectively, at 11 V. The dielectric constant and loss factor were 300 and 0.033, respectively, at 100 kHz. (C) 2001 American Institute of Physics.
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收藏
页码:1119 / 1121
页数:3
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