Effect of Ar plasma treatment on the photo-electrical properties of nanocrystal TiO2 films

被引：8

作者：

Han, JB

Wang, NA

Yu, GP

Wei, ZH

Zhou, ZG

Wang, QQ ^{[1
]}

机构：

[1] Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China

[2] Wuhan Univ, Ctr Neurosci & Nanotechnol Res, Wuhan 430072, Peoples R China

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2005年 / 88卷 / 03期

关键词：

Ar plasma treatment; nanocrystal TiO2 films; radio frequency sputtering; coating method; photo-electrical properties;

D O I：

10.1016/j.solmat.2004.12.002

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Nanocrystal TiO2 films were prepared by radio frequency (RF) sputtering technique and coating method, respectively. The samples were treated by Ar RF plasma. The crystal structure, absorption spectra and morphology of the TiO2 films were investigated by X-ray diffraction (XRD), UV-VIS spectrophotometry and atomic force microscopy (AFM). The voltages and photo-currents of the TiO2 electrodes were also measured. By Ar plasma treatment, the photocurrents of the sputtered and coated TiO2 electrodes increased by 80% and 60%, respectively. (c) 2004 Elsevier B.V. All rights reserved.

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页码：293 / 299

页数：7

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