Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

被引：112

作者：

Ma, YJ

Yang, HN

Guo, J

Sathe, C

Agui, A

Nordgren, J

机构：

[1] Sharp Microelect Technol Inc, Camas, WA 98607 USA

[2] Uppsala Univ, Dept Phys, Uppsala, Sweden

来源：

APPLIED PHYSICS LETTERS | 1998年 / 72卷 / 25期

关键词：

D O I：

10.1063/1.121601

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a-CFx is mostly of carbon rings connected by CF2 groups. The cross linking increases with substrate temperature. (C) 1998 American Institute of Physics. [S0003-6951(98)04525-2].

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页码：3353 / 3355

页数：3

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