Argon physisorption as structural probe for endohedrally doped silicon clusters

被引:84
作者
Janssens, Ewald
Gruene, Philipp
Meijer, Gerard
Woeste, Ludger
Lievens, Peter
Fielicke, Andre
机构
[1] Katholieke Univ Leuven, Inst Nanoscale Phys & Chem, Lab Solids State Phys & Magnetism, B-3001 Louvain, Belgium
[2] Free Univ Berlin, Inst Phys Expt, D-14195 Berlin, Germany
[3] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
关键词
D O I
10.1103/PhysRevLett.99.063401
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report on an element-dependent critical size for argon physisorption at 80 K on transition-metal-doped silicon clusters. Argon does not attach to elemental silicon clusters but only to surface-located transition-metal atoms. Thus physisorption provides structural information. Specifically, the minimal cluster size for the formation of endohedral singly metal-doped silicon cages has been determined. The observed critical size for doubly doped silicon clusters indicates that larger caged molecules can be formed, eventually leading to the growth of metal-doped silicon nanorods.
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页数:4
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