Deposition of thin BST films in a multi-wafer planetary reactor

被引:20
作者
Ehrhart, P
Fitsilis, F
Regnery, S
Waser, R
Schienle, F
Schumacher, M
Dauelsberg, M
Strzyzewski, P
Juergensen, H
机构
[1] Forschungszentrum Julich, IFF, D-52425 Julich, Germany
[2] Aixtron AG, D-52072 Aachen, Germany
关键词
MOCVD; (Ba; Sr)TiO(3); multi-wafer reactor; liquid delivery;
D O I
10.1080/10584580008222267
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the performance of a planetary multi-wafer reactor offering extremely high Throughput due to the batch mode processing and a low cost of ownership. This reactor is combined with a liquid delivery system which mixes the liquid precursors from three differ ent sources: 0.35 molar solutions of Ba(thd)(2) and Sr(thd)(2) and a 0.4 molar solution of Ti(O-iPr)(2)(thd)(2). The composition and microstructure of the films were routinely investigated by X-ray diffraction and X-ray fluorescence analysis. As a direct consequence of the reactor design we obtain high efficiencies for the precursor incorporation in the order of 40%. Furthermore, we obtain a high uniformity of the films over 6 inch wafers. Derails of the chemistry and microstructure were investigated by secondary neutral mass spectroscopy and scanning electron microscopy. The electrical film properties are discussed in relation to microstructural properties.
引用
收藏
页码:183 / 192
页数:10
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