CPP giant magnetoresistance of NiFeCo/Cu/CoFe/Cu multilayers

被引:15
作者
Bussmann, K
Cheng, SF
Prinz, GA
Hu, Y
Gutmann, R
Wang, D
Beech, R
Zhu, J
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Rensselaer Polytech Inst, Troy, NY 12180 USA
[3] Nonvolatile Elect Inc, Eden Prairie, MN 55344 USA
[4] Carnegie Mellon Univ, Pittsburgh, PA 15213 USA
关键词
CPP GMR; magnetic multilayers; chemical-mechanical polishing; current flow modeling; magnetoelectronic devices;
D O I
10.1109/20.706313
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
CPP (Current perpendicular-to-plane) magnetotransport measurements have been performed on lithographically patterned magnetic multilayers of NiFeCo/Cu/CoFe/Cu, We implement chemical-mechanical polishing produce very low Cu-Cu interface resistance that allows accurate, intrinsic giant magnetoresistance (GMR) values to be obtained, Measured GMR is found to be dependent on device size but can be interpreted as the change in the resistivity of the magnetic multilayer and the effects of nonuniform current distribution. Computer simulations account for the non-uniform current distribution and allow us to determine the intrinsic CPP GMR and verify the negligible contact resistance in these structures.
引用
收藏
页码:924 / 926
页数:3
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