Chemically amplified photosensitive poly(benzoxazole)

被引：18

作者：

Ebara, K ^{[1
]}

Shibasaki, Y ^{[1
]}

Ueda, M ^{[1
]}

机构：

[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2003年 / 16卷 / 02期

关键词：

photosensitivity; poly(benzoxazole); photoacid generator; norbornene; end-capping; chemical amplification;

D O I：

10.2494/photopolymer.16.287

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A novel chemically amplified photosensitive poly (benzoxazole) (PBO) precursor based on partially tert-buthoxycarbonylated (t-BOC) poly (o-hydroxyamide) having norbornene end-capping groups 5 and diphenyliodonium-9,10-dimethoxyantracene-2-sulfonate (DIAS) as a photo-acid generator has been developed. The resist showed a sensitivity of 60 mJ cm(-2) and a contrast of 2.5 when it was exposed to 365 rim light, followed by post-baking at 120 degreesC for 5min and developing with 2.38 wt% aqueous tetramethylammonium hydroxide (TMAH) solution at 25 degreesC. A fine positive image featuring 10 mum line and space patterns was obtained on the film exposed to 100 mJ cm(-2) of UV-light at 365 nm by the contact mode. By heat treatment at 350 degreesC for 1h, this positive image gave the cross-linked PBO retaining its original shape that indicated high durability during thermal process.

引用

页码：287 / 292

页数：6

共 7 条

[1] Photopatternable insulating materials [J].