Electrical resistance of copper phthalocyanine thin films as influenced by substrates, electrodes and physical features of the films

被引:16
作者
deHaan, A
Decroly, A
机构
[1] Dept. of Gen. Chem. and Electrochem., Faculté Polytechnique de Mons
关键词
copper phthalocyanine; electrical resistance; gas sensors;
D O I
10.1016/0925-4005(95)01790-9
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The influence of several features upon the electrical resistance of gas-sensitive copper phthalocyanine (CuPc) thin films has been investigated. The main factors studied concern the substrate nature (Al2O3 or Si/SiO2), electrode layout, film thickness and deposition rate. Subsequent annealing round 200 degrees C may induce more or less deep structural changes subject to the type of substrate. Molecular deterioration may also occur by way of electrochemical processes under some conditions. The effect of humidity on the electrical resistance also appears to be substrate dependent.
引用
收藏
页码:143 / 150
页数:8
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