Laser ablation and micropatterning of thin TiN coatings

被引:80
作者
Kononenko, TV
Garnov, SV
Pimenov, SM
Konov, VI
Romano, V
Borsos, B
Weber, HP
机构
[1] Moscow Gen Phys Inst, Moscow 117942, Russia
[2] Univ Bern, Inst Appl Phys, CH-3012 Bern, Switzerland
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2000年 / 71卷 / 06期
关键词
D O I
10.1007/s003390000572
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser ablation of thill TIN films deposited on steel substrates has been studied under wide-range variation of irradiation conditions (pulsewidth, wavelength, energy density and spot size). It has been demonstrated that both picosecond (150-300 Ds) and nanosecond (5-9 ns) laser pulses were suitable for controllable ablation and microstructuring of a 1-mum-thick TiN film unlike longer 150-ns pulses. The ablation rate was found to be practically independent of the wavelength (270-1078 nm) and pulsewidth (150 ps-9 ns), but it increased substantially when the size of a laser spot was reduced from 15-60 mum to 3 mum. The laser ablation technique was applied to produce microstructures in the thin TiN films consisting of microcraters with a typical size of 3-5 mum in diameter and depth less than 1 mum Tests of lubricated sliding of the laser-structured TiN films against a steel ball showed that the durability of lubricated sliding increased by 25% as compared to that of the original TiN film.
引用
收藏
页码:627 / 631
页数:5
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