Photorefractive p-i-n diode quantum well operating at 1.55 mu m

被引:11
作者
DeMatos, C [1 ]
LeCorre, A [1 ]
LHaridon, H [1 ]
Lambert, B [1 ]
Salaun, S [1 ]
Pleumeekers, J [1 ]
Gosselin, S [1 ]
机构
[1] INSA RENNES,PHYS SOLIDES LAB,F-35043 RENNES,FRANCE
关键词
D O I
10.1063/1.116642
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate the performance of a semiconductor photorefractive p-i-n diode operating at 1.55 mu m in the longitudinal quantum-confined Stark geometry. The device structure consists of a semi-insulating InP-GaInAs(P) multiple quantum well, sandwiched between two trapping regions, and embedded in a p-n junction. In this structure, the measured output diffraction efficiency reaches 0.6%. This value is close to the output diffraction efficiency value estimated from electroabsorption measurements. (C) 1996 American Institute of Physics.
引用
收藏
页码:3576 / 3578
页数:3
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