Microstructure development and dielectric properties of hydrothermal BaTiO3 thin films

被引:63
作者
McCormick, MA [1 ]
Slamovich, EB [1 ]
机构
[1] Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
基金
美国国家科学基金会;
关键词
BaTiO3 and titanates; capacitors; dielectric properties; films; hydrothermal methods;
D O I
10.1016/S0955-2219(03)00022-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Polycrystalline BaTiO3 thin films were processed hydrothermally by reacting TiO2 films at 90 degreesC in alkaline solutions containing Ba2+. Films grown on (100) SrTiO3 suggested that BaTiO3 nucleation occurred at the film-substrate interface as well as the film-a solution interface. As-reacted BaTiO3 films grown on Pt-coated glass substrates had a dielectric constant and tandelta of 80 and 0.20 respectively. Current-voltage (I-V) measurements suggested that the leakage mechanism combined aspects of Poole-Frenkel and Schottky-barrier controlled processes, and had an associated metal/ceramic barrier height of 0.46 eV. Annealing the BaTiO3 films at 200-500 degreesC in air resulted in lower values for dielectric constant, tandelta, and leakage current, and a larger barrier height. (C) 2003 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2143 / 2152
页数:10
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