Slow pH response effects of silicon nitride ISFET sensors

被引:48
作者
Woias, P
Meixner, L
Frostl, P
机构
[1] Fraunhofer Inst Solid State Technol, D-80686 Munich, Germany
[2] Tech Univ Munich, Inst Integrated Circuits LIS, D-80290 Munich, Germany
关键词
ISFET; silicon nitride gate-insulator; pH measurement; slow pH response;
D O I
10.1016/S0925-4005(98)00032-X
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
To examine the slow pH response of ion sensitive held effect transistors (ISFETs) with a silicon nitride gate-insulator, measurements were carried out in a thermostated measurement set-up by generating a stepwise increase and decrease of the pH in a range between pH 5 and 8. The slow response curves obtained were fitted to a multiexponential model to extract time constants and amplitudes of the various response effects. As a result, two exponential effects with different behaviour were found for the slow pH response. Moreover, a dependence of the response time from the direction of the pH-step was found. Based on these results, a buried layer beneath the gate-insulator surface with a heterogeneous site distribution is proposed as a phenomenological explanation for the slow response. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:501 / 504
页数:4
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