Spray pyrolytic deposition and characterization of lanthanum selenide (La2Se3) thin films

被引:12
作者
Bagde, GD [1 ]
Sartale, SD [1 ]
Lokhande, CD [1 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Lab, Kolhapur 416004, Maharashtra, India
关键词
spray pyrolysis; lanthanum selenide (La2Se3) thin films; crystal structure; surface morphology; electric and dielectric;
D O I
10.1016/S0169-4332(03)00201-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The versatile spray pyrolysis technique was employed to prepare thin films of lanthanum selenide (La2Se3) on glass and fluorine doped tin oxide (FTO) coated glass substrates under optimized conditions. The deposition temperature was 250 degreesC. The X-ray studies reveal that the films are polycrystalline with single La2Se3 phase. The estimated optical band gap was found to be 2.6 eV. The dielectric properties such as dielectric constant and dielectric loss of the films deposited on FTO coated glass substrates were measured with FTO-La2Se3-Ag structure as a function of frequency and the results are reported. At room temperature dielectric constant and dielectric loss for I kHz frequency were found to be 6.2 and 0.048, respectively. The room temperature electrical resistivity was of the order of 10(5) Omegacm. The La2Se3 films are found to be n-type semiconductor. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:27 / 35
页数:9
相关论文
共 16 条
[1]  
Bagde GD, 2000, INDIAN J ENG MATER S, V7, P390
[2]   Electrical properties of thermally evaporated tellurium thin films [J].
Balasubramaniam, T ;
Narayandass, SK ;
Mangalaraj, D .
BULLETIN OF MATERIALS SCIENCE, 1997, 20 (01) :79-92
[3]   DIELECTRIC PROPERTIES OF ALUMINUM-OXIDE FILMS [J].
BIREY, H .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) :2898-2904
[4]  
CARTHY GJ, 1998, RARE EARTH MODERN SC
[5]   PREPARATION AND SOME PHYSICAL-PROPERTIES OF SUPERCONDUCTING LA3-XS4 AND LA3-YBAYS4 [J].
ISOBE, M ;
HAYASHI, A ;
UEDA, Y .
PHYSICA C, 1994, 235 :777-778
[6]  
*JCPDS, 1994, 19659 JCPDS
[7]   High-pressure synthesis of LaMS3 (M = Ti, V, Cr) [J].
Kikkawa, S ;
Fujii, Y ;
Miyamoto, Y ;
Kanamaru, F ;
Meerschaut, A ;
Lafond, A ;
Rouxel, J .
JOURNAL OF SOLID STATE CHEMISTRY, 1998, 139 (02) :233-237
[8]   DIELECTRIC BEHAVIOR OF LANTHANUM OXIDE THIN-FILM CAPACITORS [J].
MAHALINGAM, T ;
RADHAKRISHNAN, M ;
BALASUBRAMANIAN, C .
THIN SOLID FILMS, 1981, 78 (03) :229-233
[9]   Dynamic work function shift in cold cathode emitters using current carrying thin films [J].
Mumford, PD ;
Cahay, M .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (05) :2176-2179
[10]  
NIKAM PS, 1994, INDIAN J PURE AP PHY, V32, P324