Three Dimensional Nanofabrication Using Surface Forces

被引:53
作者
Cho, Jeong-Hyun [1 ]
Azam, Anum [1 ]
Gracias, David H. [1 ,2 ]
机构
[1] Johns Hopkins Univ, Dept Chem & Biomol Engn, Baltimore, MD 21218 USA
[2] Johns Hopkins Univ, Dept Chem, Baltimore, MD 21218 USA
基金
美国国家科学基金会;
关键词
NETWORKS; OBJECTS; REFLOW; VIRUS; SCALE;
D O I
10.1021/la1013889
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We describe strategies to curve, rotate, align, and bond precisely patterned two-dimensional (2D) nanoscale panels using forces derived from a minimization of surface area of liquefying or coalescing metallic grains. We demonstrate the utility of this approach by discussing variations in template size, patterns, and material composition. The strategy provides a solution path to overcome the limitation of inherently 2D lithographic processes by transforming 2D templates into mechanically robust and precisely patterned nanoscale curved structures and polyhedra with considerable versatility in material composition.
引用
收藏
页码:16534 / 16539
页数:6
相关论文
共 36 条
[1]  
Adamson A.W., 1967, Physical Chemistry of Surfaces
[2]   The Structure of Virus Capsids [J].
Andersson, Sten .
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 2008, 634 (12-13) :2161-2170
[3]  
[Anonymous], 2009, FUNDAMENTALS MODERN, DOI DOI 10.1017/CBO9781139195065
[4]  
BALL P, 2009, NATURES PATTENS TAPE
[5]   Self-assembly of mesoscale objects into ordered two-dimensional arrays [J].
Bowden, N ;
Terfort, A ;
Carbeck, J ;
Whitesides, GM .
SCIENCE, 1997, 276 (5310) :233-235
[6]   Design and self-assembly of open, regular, 3D mesostructures [J].
Breen, TL ;
Tien, J ;
Oliver, SRJ ;
Hadzic, T ;
Whitesides, GM .
SCIENCE, 1999, 284 (5416) :948-951
[7]   30nm physical gate length CMOS transistors with 1.0 ps n-MOS and 1.7 ps p-MOS gate delays [J].
Chau, R ;
Kavalieros, J ;
Roberds, B ;
Schenker, R ;
Lionberger, D ;
Barlage, D ;
Doyle, B ;
Arghavani, R ;
Murthy, A ;
Dewey, G .
INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST, 2000, :45-48
[8]   Self-Assembly of Lithographically Patterned Nanoparticles [J].
Cho, Jeong-Hyun ;
Gracias, David H. .
NANO LETTERS, 2009, 9 (12) :4049-4052
[9]  
CHO JH, 2010, ADV MAT
[10]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87