Spin-dependent tunneling through a symmetric semiconductor barrier

被引:205
作者
Perel', VI [1 ]
Tarasenko, SA
Yassievich, IN
Ganichev, SD
Bel'kov, VV
Prettl, W
机构
[1] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[2] Univ Regensburg, Fak Phys, D-93040 Regensburg, Germany
关键词
D O I
10.1103/PhysRevB.67.201304
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The problem of electron tunneling through a symmetric semiconductor barrier based on zinc-blende-structure material is studied. The k(3) Dresselhaus terms in the effective Hamiltonian of bulk semiconductor of the barrier are shown to result in a dependence of the tunneling transmission on the spin orientation. The difference of the transmission probabilities for opposite spin orientations can achieve several percents for the reasonable width of the barriers.
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页数:3
相关论文
共 17 条
[1]  
Awschalom DD, 2002, NANOSCI TECHNOL, P147
[2]  
BYCHKOV YA, 1984, JETP LETT+, V39, P78
[3]   SPIN-ORBIT COUPLING EFFECTS IN ZINC BLENDE STRUCTURES [J].
DRESSELHAUS, G .
PHYSICAL REVIEW, 1955, 100 (02) :580-586
[4]   Spin-dependent current transmission across a ferromagnet-insulator-two-dimensional electron gas junction [J].
Hammar, PR ;
Johnson, M .
APPLIED PHYSICS LETTERS, 2001, 79 (16) :2591-2593
[5]   Efficient electrical spin injection from a magnetic metal/tunnel barrier contact into a semiconductor [J].
Hanbicki, AT ;
Jonker, BT ;
Itskos, G ;
Kioseoglou, G ;
Petrou, A .
APPLIED PHYSICS LETTERS, 2002, 80 (07) :1240-1242
[6]  
Ivchenko E. L., 1997, Superlattices and Other Heterostructures: Symmetry and Optical Phenomena
[7]   Spin-filter device based on the Rashba effect using a nonmagnetic resonant tunneling diode [J].
Koga, T ;
Nitta, J ;
Takayanagi, H .
PHYSICAL REVIEW LETTERS, 2002, 88 (12) :4-126601
[8]  
MOSTNYI VF, CONDMAT0110240
[9]   Theory of electrical spin injection: Tunnel contacts as a solution of the conductivity mismatch problem [J].
Rashba, EI .
PHYSICAL REVIEW B, 2000, 62 (24) :R16267-R16270
[10]   Fundamental obstacle for electrical spin injection from a ferromagnetic metal into a diffusive semiconductor [J].
Schmidt, G ;
Ferrand, D ;
Molenkamp, LW ;
Filip, AT ;
van Wees, BJ .
PHYSICAL REVIEW B, 2000, 62 (08) :R4790-R4793